Úplné zobrazení záznamu

Toto je statický export z katalogu ze dne 09.12.2023. Zobrazit aktuální podobu v katalogu.

Bibliografická citace

.
0 (hodnocen0 x )
EB
EB
ONLINE
Cham : Springer International Publishing : 2017
1 online zdroj
Externí odkaz    Plný text PDF 
   * Návod pro vzdálený přístup 


ISBN 978-3-319-24672-7 (e-kniha)
ISBN 978-3-319-24670-3 (print)
SpringerBriefs in Materials, ISSN 2192-1091
This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis.   The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. Contents: Introduction -- Fundamentals of Gas Phase Transport on Nanostructured Materials -- Modeling Thin Film Growth on Nanostructured Materials -- Advanced Concepts..
001476361

Zvolte formát: Standardní formát Katalogizační záznam Zkrácený záznam S textovými návěštími S kódy polí MARC